1. A Study of Block-Copolymer Lithography using Deep Learning

    • Action: Principal Researcher
    • Support: 5,000 $, Research Promotion Fund by Hongik University (2024S106501)
    • Period: 2024.03.01 ~ 2025.02.28 (12 Months)

  2. Simulation study of thermal reflow process for resolution enhancement with Deep Learning

    • Action: Principal Researcher
    • Support: 5,000 $, Research Promotion Fund by Hongik University (2023S106501)
    • Period: 2023.03.01 ~ 2024.02.28 (12 Months)

  3. A Study of Pellicle Contamination Particles of Extreme Ultraviolet lithography

    • Action: Principal Researcher
    • Support: 5,000 $, Research Promotion Fund by Hongik University (2022S100301)
    • Period: 2022.03.01 ~ 2023.02.28 (12 Months)

  4. Computational 10-nm plasmon nano-patterns of block copolymer self-assembly

    • Action: Principal Researcher
    • Support: 5,000 $, Research Promotion Fund by Hongik University (2021S108201)
    • Period: 2021.03.01 ~ 2022.02.28 (12 Months)

  5. Study of exposure parameters for the development of Extreme Ultraviolet (EUV) Lithography resists

    • Action: Principal Researcher
    • Support: 5,000 $, Research Promotion Fund by Hongik University (2020S133801)
    • Period: 2020.03.01 ~ 2021.02.28 (12 Months)

  6. Study of Extreme Ultraviolet (EUV) Lithography Process for 5-nm Pattern Transister Development

    • Action: Principal Researcher
    • Support: 18,000 $, New Processor Research Fund by Hongik University (2020S101701)
    • Period: 2020.03.01 ~ 2021.02.28 (12 Months)

  7. Vertual Mass Productional Lithography Self-Assembly for the Below 10-nm Pattern Formation: Integration between top-down method and bottom-up metho

    • Action: Principal Researcher
    • Support: 40,000 $, the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund)
    • General Research Grants (Basic Research Area) (2009-0074676)
    • Period: 2009.05.01 ~ 2010.04.30 (12 Months)

  8. Polarization Effects and Its Application of High NA ArF Lithography for 20 nm pattern formation

    • Action: Principal Researcher
    • Support: 8,000 $, the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund)
    • New Professor Support (Basic Research Area) (KRF-2006-331-D00306)
    • Period: 2006.07.01 ~ 2007.06.30.(12 Months)