1. New Professor Support (Basic Research Area) (KRF-2006-331-D00306)

    • Title: Polarization Effects and Its Application of High NA ArF Lithography for 20 nm pattern formation
    • Action: Principal Researcher
    • Support: 8,000 $, the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund)
    • Period: 2006.07.01 ~ 2007.06.30.(12 Months)

  2. General Research Grants (Basic Research Area) (2009-0074676)

    • Title: Vertual Mass Productional Lithography Self-Assembly for the Below 10-nm Pattern Formation: Integration between top-down method and bottom-up method
    • Action: Principal Researcher
    • Support: 40,000 $, the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund)
    • Period: 2009.05.01 ~ 2010.04.30 (12 Months)