| JOURNAL PAPERS (SCI) |
| 16. Sang-Kon Kim, "Thermal Effect Study for a Chemically Amplified Resist," Journal of
Korean Physical Society (JKPS), Vol.49, No. 3, 1211-1216, Sep. (2006). Impact Factor = 1.328
[abstract] |
| 15. Sang-Kon Kim and Tae Seon Kim, "Simulator for the Design Considered Critical
Dimension Bias in Resist Reflow Process," Journal of Korean Physical Society (JKPS),
Vol.48, No. 6, 1661-1665, June (2006). Impact Factor = 1.328
[abstract] |
| 14. Sang-Kon Kim, "Model-Based Optical Proximity Correction for Resist Reflow
Process," Japanese Journal of Applied Physics (JJAP) Vol. 45, No. 6B, 5440-5444, June (2006).
Impact Factor = 1.222
[abstract] |
| 13. Sang-Kon Kim, "Resist Reflow Process Simulation Study for Contact Hole Pattern,"
Journal of Vacuum Science and Technology (JVST) B, Vol.24, 200-204, Jan./Feb. (2006). Impact Factor = 1.597
[abstract] |
| 12. Sang-Kon Kim, Ji-Eun Lee, Seung-Wook Park, Hye-Keun Oh,"Optical Lithography Simulation
for the Whole Resist Process, "Current Applied Physics, Vo.6,Issue 1, 48~53, Jan. (2006). (SCIE)
Impact Factor = 1.184
[abstract]
|
| 11. Sang-Kon Kim, Hye-Keun Oh, "Simulator for Resist-Reflow Process by Boundary Movement,"
Journal of Korean Physical Society (JKPS), Vol.47, S377-S380, Nov. (2005). Impact Factor = 1.328
[abstract] |
| 10. Sang-Kon Kim, "Physical Characteristic Effects of Contact Hole Reflow,"
Japanese Journal of Applied Physics (JJAP), Vol.44, No.10, 7384-7389, Oct. (2005). Impact Factor = 1.222
[abstract] |
| 9. Sang-Kon Kim, Hye-Keun Oh, Ilsin An, Sung-Muk Lee, Cheol-Kyu Bok, and
Seung-Chan Moon, "Bulk Effects of Thermal Flow Resists," Journal of Korean Physical Society (JKPS),
Vol.46, No.6,1439~1444, June (2005). Impact Factor = 1.328
[abstract] |
| 8. Sang-Kon Kim and Hyn-Kun Oh, "A Study of Process Parameter Control for Nanopattern,"
Journal of the Korean Physical Society(JKPS), Vol.45, S736 ~ S739, Dec.(2004). Impact Factor = 1.328
[abstract] |
| 7. Sang-Kon Kim, "Exposure Simulation Model for Chemically Amplified Resists."
OPTICAL REVIEW Vol. 10, No. 4, 335-338 (July/Aug. 2003). Impact Factor = 0.576
[abstract]
|
| 6. Sang-Kon Kim, "Pattern Collapse for Nanoline Formation," Journal of the Korean Physical
Society (JKPS), Vol. 42, Feb. S371-S375 (2003). Impact Factor = 1.328
[abstract] |
| 5. Ji-Yong Yoo, Young-Keun Kwon, Jun-Taek Park, Dong-Soo Sohn, Sang-Kon Kim
, Young-Su Sohn and Hye-Keun Oh, "Prediction of the Critical Dimensions by Using a Threshold
Energy Resist Model," Journal of the Korean Physical Society (JKPS), Vol. 42, No. 2,
191-195 (2003). Impact Factor = 1.328
|
| 4. Sang-Kon Kim, Ji-Yong Yoo and Hye-Keun Oh, "Resist Distribution Effect of Spin Coating,"
Journal of Vacuum Science and Technology (JVST) B, Vol. 20, Issue 6, 2206~2209 Nov. (2002). Impact Factor = 1.597
[abstract]
|
| 3. Sang-Kon Kim and Hye-Keun Oh, "Bulk Image Formation of Scalar Modeling in Photoresist,"
Journal of the Korean Physical Society (JKPS), Vol. 41, No. 4, 456-460
(2002). Impact Factor = 1.328
[abstract] |
| 2. Sang-Kon Kim and Hye-Keun Oh, "Sensitivity of Simulation Parameter for
Critical Dimension," the Japanese Journal of Applied Physics (JJAP), Vol. 41, No. 6B, 4222-4227 (2002). Impact Factor = 1.222
[abstract] |
| 1. Eun-Jung Seo, Heung-Jin Bak, Sang-Kon Kim, Young-Soo Sohn
and Hye-Keun Oh, "Modification of Development Parameter for a Chemically Amplified Resist
Simulator," Journal of the Korean Physical Society (JKPS), Vol. 40, No. 4, 725~728 (2002).
Impact Factor = 1.328
|
|
| CONFERENCE PROCEEDINGS (Foreign) |
15. Sang-Kon Kim, "Thermal Mechanism for Optical Proximity Correction,"
5th International Conference on Optics-photonics Design & Fabrication (ODF), 191, Nara Japan, Dec. (2006).
|
| 14. Sang-Kon Kim, "Thermal Mechanism for Optical Proximity Correction," Micro-and Nano-engineering (MNE),
755, Barcelona Spain, Sep. (2006).
|
| 13. Sang-Kon Kim, "Thermal effects study of chemically amplified resist," SPIE Microlithography,
Vol. 6153, 61533R San Jose, California USA March (2006). [abstract]
|
| 12. Sang-Kon Kim, "OPC of resist reflow process," SPIE Microlithography, Vol. 6153, 61530Y,
San Jose, California USA March 2006 (Oral Presentation). [abstract]
|
| 11. Sang-Kon Kim, "Model-based OPC for Resist Reflow Process," 2005 International Microprocess and Nanotechnology
Conference(MNC), the Japanese Journal of Applied Physics (JJAP), p.18-19, Tokyo Japan Oct. 2005.
|
| 10. Sang-Kon Kim, Ilsin An, Hye-Keun Oh, Sun Muk Lee, Cheolkyu Bok, and Seung Chan Moon, "Contact Hole Reflow of Finite Element Method," SPIE Microlithography,
Vol. 5753, p.1194-1201, San Jose, California USA March 2005. [abstract]
|
| 9. Sang-Kon Kim, Ilsin An, Hye-Keun Oh, Sun Muk Lee, Cheolkyu Bok, and Seung Chan Moon, "Simulation of Thermal Resist Reflow Process," SPIE Microlithography,
Vol. 5753, p.1186-1193, San Jose, California USA March 2005. [abstract]
|
| 8. Sang-Kon Kim, Ji-Eun Lee, Seung-Wook Park, Ji-Yong Yoo and Hye-Keun Oh,
"Simulation Benchmarking for the Whole Resist Process," SPIE Microlithography, Vol. 5378,
San Jose, California USA March 2004 (Oral Presentation).
|
| 7. Sang-Kon Kim and Hye-Keun Oh, "Exposure Simulation of Electron Beam Microcolumn
Lithography," SPIE Microlithography, Vol. 5374, San Jose, California USA March 2004.
|
| 6. Sang-Kon Kim, Hye-Keun Oh and Ho Seob Kim, "Proximity Effects for Rinse, Dry, and Etch Parameters,"
SPIE Photomask 2003, Vol. 5130, Japan April 2003.
|
| 5. Sang-Kon Kim, "Sensitivity of Rinse and Dry and Etch Parameters," SPIE Microlithography,
Vol. 5040, San Jose, California USA. March 2003 (Oral Presentation).
|
| 4. Sang-Kon Kim and Hye-Keun Oh, "Exposure Simulation Modeling for
Chemically Amplified Resists," ODF 2002, Tokyo Japan Oct. 2002.
|
| 3. Sang-Kon Kim, Ji-Yong Yoo and Hye-Keun Oh, "Resist distribution effect
of spin coating," Proc. SPIE Microlithography, Vol. 4691, San Jose, California USA March 2002.
|
| 2. Sang-Kon Kim, Dong-Soo Sohn, Eun-Jung Seo, Jin-Young Kim, Young-Soo
Sohn and Hye-Keun Oh, "Simulation Parameter Effects on Critical Dimension and Sensitivity
of 193 nm Chemically Amplified Resist," 2001 International Microprocess and Nanotechnology
Conference (MNC), the Japanese Journal of Applied Physics (JJAP), Japan Oct. 2001.
|
| 1. Sang-Kon Kim, C.H.Oh, S.H. Song, P. S. Kim, "Most Effective Optical Device
Module Packages Using Passive Alignment Packaging Technique," IPC`98, Taiwan, R.O.C.
Dec. 1998.
|
|
| CONFERENCE PROCEEDINGS (Domestic) |
| 40. Sang-Kon Kim, "Polarization Effects for 20 nm pattern generation by High NA ArF lithography,"
in the fall conference on physics, the Korea Physical Society,
Vol. 24, 2, p.418 Oct. 2006 (Oral Presentation).
|
| 39. Sang-Kon Kim, "Process extension techniques for 25nm half pitch pattern generation,"
International Symposium on the Physics of Semiconductors and Applications 2006, p.431, Ramada Plaza Jeju Hotel,
Jeju, August. 2006 (Oral Presentation).
|
| 38. Sang-Kon Kim, "Study of polarized effects in high NA image," International Symposium
on the Physics of Semiconductors and Applications 2006, p.324, Ramada Plaza Jeju Hotel, Jeju August. 2006.
|
| 37. Sang-Kon Kim, "Process Extension Techniques for sub-50 nm Pattern Generation,"
in the spring conference on physics, the Korea Physical Society,
Vol. 24, 1, p.110 April. 2006 (Oral Presentation).
|
| 36. Sang-Kon Kim, "Simulator for the Design Considered Resist Reflow Bias," SEMI Tech.
Symposium (SEMICON KOREA), p.41, Seoul, Feb. 2006 (Oral Presentation).
|
| 35. Sang-Kon Kim , "Simulation for the Design Considered Critical Dimension Bias in
Resist Reflow Process," the 4th International Conference on Advanced Materials and Devices (ICAMD 2005),
p.386, Dec. 2005.
|
| 34. Sang-Kon Kim , "Soft baking Effects on the Fine Pattern," the 4th International
Conference on Advanced Materials and Devices (ICAMD 2005) p.431, Dec. 2005.
|
| 33. Sang-Kon Kim, "Proximity Correction of Thermal Resist Flow Process,"
in the fall conference on physics, the Korea Physical Society,
Vol. 23, 2, pp.453 Oct. 2005.(Oral Presentation, Korean Edition).
|
| 32. Young-Du Jen, Min-Gy Choi, Eun-Jin Kim, hyun-Wog Oh, Eun-Syl Song, Jong-Sun Kim,
Sang-Kon Kim, Hye-Keun Oh, "Reflectvie multi-layers anslysis by using FDTD,"
in the spring conference on physics, the Korea Physical Society, Vol. 23, 1, pp.236 April. 2005.
|
| 31. Sang-Kon Kim, "Analysis of Contact Hole Reflow using Finite Element Methods,"
in the spring conference on physics, the Korea Physical Society,
Vol. 23, 1, pp.167 April. 2005.
|
| 30. Sang-Kon Kim and Hye-Keun Oh, "Resist Reflow Simulation of Boundary Movement," The 12th
Korean Conference on Semiconductors, 1st volume, pp.141-142, Feb. 2005
(Oral Presentation, Korean Edition).
|
| 29. Sang-Kon Kim and Hye-Keun Oh, "Simulated Thermal Resist Reflow for Contact Hole,¡±
SEMI Tech. Symposium (SEMICON KOREA), p.17-19, Seoul, Feb. 2005 (Oral Presentation).
|
| 28. Sang-Kon Kim, "Bulk Effects of the Thermal Flow Resists," ISNM Vol. 22, 2, pp.583 Nov. 2004.
|
| 27. Sang-Kon Kim, "Simlation of Contact Hole's Thermal Flow,"
in the spring conference on physics, the Korea Physical Society,
Vol. 22, 2, pp.583 Oct. 2004.
|
| 26. Myeng-Sol Yoo, Young-Du Jen, Min-Gy Choi, Sang-Kon Kim, Hye-Keun Oh, "The Search
for Optimum Extreme Ultraviolet Mask in Terms of Reducing the Absorber Shadow Effects,"
in the fall conference on physics, the Korea Physical Society,
Vol. 22, 2, pp.592 Oct. 2004.
|
| 25. Young-Du Jen, Myeng-Sol Yoo, Min-Gy Choi, Eun-Jin Kim, Sang-Kon Kim,
Hye-Keun Oh, "Mask Structure Optimization for Shadow Effect Reduction in Extreme Ultraviolet Lithography,"
in the spring conference on physics, the Korea Physical Society,
Vol. 22, 2, pp.591 Oct. 2004.
|
| 24. Sang-Kon Kim, "Optical Lithography Simulation for Semicondutor Processes,"
in the spring conference on physics, the Korea Physical Society,
Vol. 22, 1, pp.264 April 2004 (Oral Presentation, Korean Edition).
|
| 23. Sang-Kon Kim, "Modeling and Simulation for Etch process,"
in the spring conference on physics, the Korea Physical Society,
Vol. 21, 1, pp.265 April 2003 (Oral Presentation, Korean Edition).
|
| 22. Sang-Kon Kim, "Prevented model of Nano Pattern Collapse," International Symposium
on Nano Science & Technology, The Korean Physical Society, pp.58, Oct. 2002.
|
| 21. Sang-Kon Kim and Hye-Keun Oh, "Pattern Collapsing for nanoline formation,"
the 11th Seoul International Symposium on the Physics of Semiconductors and Application (ISPSA)
, August 2002.
|
| 20. Sang-Kon Kim and Hye-Keun Oh, "Spin Coating, Exposure Tool, and Exposure
Modeling for Lithography CAD," ITRC Forum 2002, Korea IT industry Promotion Agency (Oral Presentation,
May 2002).
|
| 19. Sang-Kon Kim, H. J. Lee and Hye-Keun Oh, "Profile formation for 157-nm
lithography Simulation," in the spring conference on physics, the Korea Physical Society, Vol. 20, 1,
pp.196 2002 (Oral Presentation, Korean Edition).
|
| 18. Sang-Kon Kim and Hye-Keun Oh, "Bulk Image Formation for Chemically
Amplified Resists," The 9th Korean Conference on Semiconductors, pp.365-366, Feb. 2002
(Oral Presentation, Korean Edition).
|
| 17. Sang-Kon Kim, Ji-Yong Yoo, Young-Soo Sohn and Hye-Keun Oh, "Effect of
simulation parameters for the sensitivity of critical dimension," in the fall conference on physics, the Korea Physical
Society, Vol. 19, 2, pp.514 Oct. 2001 (Oral Presentation, Korean Edition).
|
| 16. Sang-Kon Kim, Dong-Soo Sohn, Eun-Jung Seo, Jin-Young Kim, Young-Soo Sohn
and Hye-Keun Oh, "Analysis of the Relation between Exposure Parameters and Critical Dimension
and Modification of Development Parameters of 193 nm Chemically Amplified Resist," ITRC Forum
2001, Korea IT Industry Promotion Agency, pp.B6-18~21 (2001) (Oral Presentation).
|
| 15. Sang-Kon Kim, Dong-Soo Sohn, H. -J. Park, Young-Soo Sohn and Hye-Keun Oh,
"Post Exposure Delay Effect Modeling and Simulation in Chemically Amplified Resists," Proc. of The
Optical Society of Korea Annual Meeting, pp.78~79 Feb. 2001 (Korean Edition).
|
| 14. Eun-Jung Seo, H. -J. Bak, Sang-Kon Kim, Young-Soo Sohn and Hye-Keun Oh,
"Modification of Development Parameter for Chemically Amplified Resist Simulator," The
8th Korean Conference on Semiconductors, COSAR, pp.743-744 Feb. 2001.
|
| 13. Sang-Kon Kim, Young-Mi Lee, Eun-Jung Seo, H. -J. Park, Young-Soo Sohn and
Hye-Keun Oh, "The Exposure Simulation Modeling for Chemically Amplified Resists," The 8th
Korean Conference on Semiconductors, COSAR, pp.83~84 Feb. 2001 (Oral Presentation,
Korean Edition).
|
| 12. Sang-Kon Kim, Eun-Jung Seo, Dong-Soo Sohn, K. -O. Jen, J. H. Kim,
Ji-Yong Yoo, H. -J. Park, Young-Soo Sohn and Hye-Keun Oh, "Physical meaning of
exposure parameters by simulation," in the spring conference on physics, the Korea Physical Society, Vol. 19, 1, pp.202
April 2001 (Oral Presentation, Korean Edition).
|
| 11. Sang-Kon Kim, Jin-Young Kim, Young-Mi Lee, Eun-Mi Lee, Dong-Soo Sohn,
Eun-Jung Seo, Young-Soo Sohn, H. -J. Park and Hye-Keun Oh, "Modeling Analysis of exposure
simulation for 193 nm chemical amplified resist 193nm," in the fall conference on physics,
the Korea Physical Society, Vol. 18, 2, pp.410 Oct. 2000 (Korean Edition).
|
| 10. Sang-Kon Kim, Young-Mi Lee, Moon-Gyu Sung, Jin-Young Kim, Sun-Yong Cho,
Jin-Kyung Oh, Eun-Mi Lee, Sung-Hwan Byun, Young-Soo Sohn and Hye-Keun Oh, "Mechanism
Comparison of Thickness Change between i-line and g-line resist and 193 nm chemically
amplified resist due to exposure effect," in the spring conference on physics,
the Korea Physical Society, Vol. 17, 1, pp.181 April 1999 (Korean Edition).
|
| 9. Sang-Kon Kim, Sung-Hwan Byun, Yeon-Un Jeong, Sun-Young Cho, Jin-Kyung Oh,
Young-Mi Lee, Eun-Mi Lee, Moon-Gyu Sung, Young-Soo Sohn and Hye-Keun Oh, "Effective
Lithography Simulator for Extraction of Photoresist Exposure Parameter," in the fall conference,
the Institute of Electronics Engineers of Korea, Vol. 21, 2. pp.569~572
Nov. 1998 (Korean Edition).
|
| 8. Sang-Kon Kim, "155Mbps Optical Receiver Module for B-ISDN," in the 15th Optical
and Quantum Electronics Conference, The Optical Society of Korea, pp.184~185 Aug. 1998
(Korean Edition).
|
| 7. Sang-Kon Kim, H.W. Lee, Y.K. Kim, "TDX-100 IDLC(Integrated Digital Loop Carrier),"
in the Conference Communication Sciences, Korean Institute of Communication Sciences, July 1998
(Korean Edition).
|
| 6. Sang-Kon Kim, J.H. Eu, and H.W. Lee, "Apparatus of Reframming," in the
Conference of Optoelectronics Optical Communication ¡¯98, pp.379~380, May 1998.
|
| 5. Sang-Kon Kim, C. H. Oh, and P. S. Kim, "155 Mbps Optical receiver modules
without Clock Generator for Passive Alignment Techniques," in the spring conference on physics,
The Korea Physical Society, Vol. 16, No.1, pp. 183, April 1998 (Korean Edition).
|
| 4. Sang-Kon Kim, H.W. Lee, and Y.K. Kim, "Apparatus for CCS No.7 Trunk
Signaling in narrow band ISDN," in the 8th Joint Conference on Communications & Information,
pp.564~567 April 1998 (Korean Edition).
|
| 3. Sang-Kon Kim, C.H. Oh, and P.S. Kim, "Reliability Evaluation of Optical
Transmitter & Receiver Modules," in Advance Program of 13th Conference on Waves and Lasers,
The Optical Society of Korea, pp. 34 Feb. 1998 (Korean Edition).
|
| 2. Sang-Kon Kim, Jae-Hong Eu, B. T. Seo, B. J. Ou, J. H. Cho, H. D. Oun, Y. T. Go,
M. Hang, "Reliability Evaluation of Compact 155Mbps transmitter / receiver optical modules,"
in the fall conference, The Korea Physical Society, Vol.15, 3, pp.397 Oct. 1997 (Korean Edition).
|
| 1. Sang-Kon Kim and Jae-Hong Eu, "The Productions Flow of Compact 155Mbps
transmitter / receiver optical modules," in Proc. of 14th Optics and Quantum Electronics Conference,
The Optical Society of Korea, pp.11-1~3 Aug. 1997 (Korean Edition).
|
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