| JOURNAL PAPERS (SCI) |
1. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An "Modeling
of the Cross-linking and the Diffusion Processes
in a Negative Chemically Amplified Resist," Journal of Korean Physical Society (JKPS),
Vol.55, No. 2, 661-665, August (2009). Impact Factor = 1.204
 |
 |
| 2. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An "Impact
of the Parameters for a Chemically-amplified Resist on the
Line-edge-roughness by Using a Molecular-scale Lithography Simulation," Journal of Korean Physical Society (JKPS),
Vol.55, No. 2, 675-680, August (2009). Impact Factor = 1.204
|
 |
| 3. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An "Impact of Polarization
Inside a Resist for ArF Immersion Lithography," Journal of Korean Physical Society (JKPS),
Vol.54, No. 4, 1685-1691, April (2009). Impact Factor = 1.204
|
| 4. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An "A study of
virtual lithography process for polymer directed self-assembly," Microelectronic Engineering, 87,
883-886 May-Oct. (2010). Impact Factor = 1.583
|
| 5. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An "Mechanism of
Embedded Micro / Nano Channel Formation for a Negative-Tone Photoresist by Moving Mask Lithography,"
Journal of Korean Physical Society (JKPS), vol. 56, 3, 851-855 (2010).
Impact Factor = 1.204 |
 |
| 6. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An "Simulation
Study of Sub-10 nm Pattern Formation Using Diblock Polymer Directed Self-assembly,"
Journal of Korean Physical Society (JKPS), vol. 57, 1942-1945, Dec. (2010).
Impact Factor = 1.204 |
|
| CONFERENCE PROCEEDINGS (International) |
| 1. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Embedded Micro /
Nano Channels Formation for Three-Dimensional Negative-Tone Photoresist Microstructuring,"
SPIE Microlithography, Vol. 7273, 72730R San Jose, California USA Feb. 23 (2009).
|
| 2. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Advanced
Lithography Simulation for Various 3-Dimensional Nano / Microstructruing Fabrications in
Positive- and Negative-Tone Photoresists," 2009 International Nanotech Symposium &
Exhibition in Korea (NANO KOREA 2009), Gyeonggi-do KINTEX, Korea Aug. 27 (2009). |
| 3. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Dry Etch Simulation
for Self-aligned Double Patterning," 2nd International Conference on Microelectronics and Plasma
Technology (ICMAP 2009), Busan BEXCO, Korea Sep. 23 (2009). |
| 4. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Simulation Moving
Mask Technology for 3D Micro- and Nanofabrication," 7th Fraunhofer IISB Lithography Simulation
Workshop, Hersbruck, Germany Sep. 26 (2009). |
| 5. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "A Study of Virtual
Lithography Process for Polymer Directed Self-assembly," 35th International Conference on
Micro Nano Engineering (MNE 2009), Ghent, Belgium Sep. 29 (2009). |
| 6. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Process Simulation
of Nanolithography Patterning for Polymer Directed Self-assembly," International Symposium on the Physics of
Excitation-assisted Nano-processes (ISPEN-2009), Wakayama, Japan Nov. 20 (20-21) (2009). |
| 7. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Simulation Study of
sub-10 nm Pattern Formation using Diblock Polymer Directed Self-Assembly," The 6 th International Conference
on Advanced Materials and Devices (ICAMD-2009), Jeju, Korea Dec. 10 (09-11) (2009). |
| 8. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Simulation
Study of Directed Self-Assembly for 10-nm Pattern Formation," SPIE Microlithography, San Jose,
California USA Feb. 23(21-25) (2010). |
| 9. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Predicting
the Nanolithography Pattern of Confined Block Polymer," 7th International Conference on
Optics-photonics Design & Fabrication (ODF), Yokohama, Japan, April 19-21 (2010).
|
|
| CONFERENCE PROCEEDINGS (Domestic) |
| 1. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An,
"A Study of 3-Dimensional Micro / Nano Channel Formation in Resist of Virtual Space:
Application of Bio / Nano MEMS", in the spring conference on physics, the Korea Physical Society,
Vol. 27, 2, p.121, Daejeon CVB, 23 April 2009 (Oral Presentation).
|
| 2. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Line Edge Roughness
and Line Width Roughness Analysis of Molecular Simulation for Chemically Amplified Resists",
Semicon Korea 2009, Technology Symposium (STS), Seoul, Jan. 20, 2009 (Oral Presentation).
|
| 3. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "Simulation for Various
Nano/Microfabrications in a Positive resist ",
20th Anniversary special Meeting in the Optical Society of Korea 2009, Gwangju Kimdaejung CC,
Oct. 20, 2009 (Oral Presentation).
|
| 4. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, Ilsin An, and Young-Hun Kwon
"Simulation of Directed Self-Assembly for Sub-10 nm Pattern Formation: Top-down and
Bottom-up Approches", in the fall conference on physics, the Korea Physical Society,
Vol. 27, 4, p.193, Changwon ECO, 23 Oct. 2009 (Oral Presentation).
|
| 5. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An,
"Simulation Nanolithography with both Photolithography and Polymer Directed Self-assembly,"
Semicon Korea 2010, Technology Symposium (STS), Seoul, Feb. 3, 2010 (Oral Presentation).
|
|