| JOURNAL PAPERS (SCI) |
1. Sang-Kon Kim and Hye-Keun Oh, "Influence of Mask Feature on the Diffracted
Light in Proximity and Contact Lithography," Journal of Korean Physical Society (JKPS),
Vol.53, No. 6, 3578-3583, December (2008). Impact Factor = 1.204
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| 2. Sang-Kon Kim and Hye-Keun Oh, "Solving the Navier-Stokes Equation for Thermal
Reflow," Journal of Korean Physical Society (JKPS), Vol.53, No. 5, 2682-2687, November (2008).
Impact Factor = 1.204
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| 3. Sang-Kon Kim, Hye-Keun Oh, Young-Dae Jung, and Ilsin An, "A Mask Generation
Approach to Double Patterning Technology with Inverse Lithography," Japanese Journal
of Applied Physics (JJAP) Vol. 47, No. 11, November (2008). Impact Factor = 1.247
[abstract]
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| 4. Sang-Kon Kim, "Orthogonal Functional Method for Optical Proximity Correction of
Thermal Processes in Optical Lithography," Japanese Journal of Applied Physics (JJAP)
Vol. 46, No. 12, 7662-7665, December (2007). Impact Factor = 1.222
[abstract]
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| 5. Sang-Kon Kim and Hye-Keun Oh, "Process Extension Techniques for Optical Lithography:
Thermal Treatment, Polarization and Double Patterning," Journal of Korean Physical Society (JKPS),
Vol.51, No. 4, 1413-1418, October (2007). Impact Factor = 1.328
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| 6. Sang-Kon Kim, "Polarized Effects in Optical Lithography with High NA Technology,"
Journal of Korean Physical Society (JKPS), Vol.50, No. 6, 1952-1958, June (2007). Impact Factor = 1.328
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| 7. Sang-Kon Kim, "Thermal Treatment for Optical Proximity Correction," Microelectronic
Engineering, Vol.84, 766-769, May-August. (2007). Impact Factor = 1.398
[abstract]
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| CONFERENCE PROCEEDINGS (International) |
| 1. Sang-Kon Kim, "Double Patterning Study with Inverse Lithography," SPIE Microlithography, Vol. 6923, 692323
San Jose, California USA Feb. 25 (2008). [abstract]
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| 2. Sang-Kon Kim, "Solving the Navier-Stokes Equation for Thermal Reflow,"
the 5th International Conference on Advanced Materials and Devices, Ramada Plaza Jeju Hotel, Jeju, Dec. 2007.
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| 3. Sang-Kon Kim, "Double Exposure and Double Patterning Studies with Inverse Lithography," 20th International
Microprocesses and Nanotechnology Conference (MNC), Kyoto Japan, Nov.6(5-8) (2007). |
| 4. Sang-Kon Kim, "Thermal Reflow Modeling for Elongated Contact Hole," Micro-and Nano-engineering (MNE),
Copenhagen Denmark, Sep. (2007). |
| 5. Sang-Kon Kim, "Influence of Mask Feature on the diffracted Light in Proximity and Contact
Lithography," the 10th Asia Pascific Physics Conference, POSCO International Center, POSTECH, p.117 August 2007.
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| 6. Sang-Kon Kim, "Analytical approach to high-NA images," SPIE Microlithography, Vol. 6520, 65203D,
San Jose, California USA March (2007). [abstract]
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| 7. Sang-Kon Kim, "A study of process extension technologies," SPIE Microlithography, Vol. 6519, 65193X,
San Jose, California USA March (2007). [abstract]
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| CONFERENCE PROCEEDINGS (Domestic) |
| 1. Sang-Kon Kim, "Molecular Random Approach in Lithography Process and
Self-Assembly for below 20 nm Pattern Formation: How to model Molecular Lithography
Process and Self-Assembly", in the fall conference on physics, the Korea Physical Society,
Vol. 26, 4, p.91, Gwang Ju Convention, Oct., 2008 (Oral Presentation).
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| 2. Sang-Kon Kim, "Double Patterning Mask synthesis with Inverse Lithography:
Double Patterning is a realistic technology for 20 nm half pitch formation in Semiconductor
Manufacture", in the spring conference on physics, the Korea Physical Society, Vol. 26, 2,
p.93, Daejeon CVB, April 2008 (Oral Presentation).
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| 3. Sang-Kon Kim, "Immersion Lithography Simulation,"
15th Korean Conference on Semiconductor, TP1-32, Phonix Park, Feb. 21, 2008.
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| 4. Sang-Kon Kim, "Influence of Mask Parameter on the Diffracted Light,"
Semicon Korea 2008, Vol. 1, p.45, Seoul, Jan. 31, 2008 (Oral Presentation).
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| 5. Sang-Kon Kim, "Mask Polarization Effects for sub 50-nm Pattern Generation," in the spring conference
on physics, the Korea Physical Society,Vol. 25, 2, p.83 April 2007 (Oral Presentation).
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| 6. Sang-Kon Kim, "Polarization Effects and Its Application for 20-nm half pitch Hyper NA ArF Lithography,"
Semicon Korea 2007, Vol. 1, p.119, Seoul, Jan. 31, 2007 (Oral Presentation).
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